Deposition of monolayers by retraction from solution: Ellipsometric study of cetyltrimethylammonium bromide adsorption at silica-air and silica-water interfaces

Langmuir

Volumn 14, Issue 9, 1998, Pages 2444-2450

  Eskilsson, K ^a   Yaminsky, V V ^a,b,c  

^a LUND UNIVERSITY   (Sweden)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AIR; AMMONIUM COMPOUNDS; CRITICAL MICELLE CONCENTRATION; DEPOSITION; DESORPTION; DIFFUSION; ELLIPSOMETRY; MONOLAYERS; SILICA GEL; SURFACE ACTIVE AGENTS; WATER;

CETYLTRIMETHYLAMMONIUM BROMIDE;

PHASE INTERFACES;

EID: 0032045418     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la971066j     Document Type: Article

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