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Volumn 92, Issue 8, 2002, Pages 4386-4392

Optical constants and roughness study of dc magnetron sputtered iridium films

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; BULK METALS; DC MAGNETRON SPUTTERING; DEPOSITION PROCESS; FUSED SILICA SUBSTRATES; MICRO-ROUGHNESS; MIDDLE INFRARED; OPTICAL MODELS; SPECTRAL RANGE; SURFACE OVERLAYERS; VACUUM ULTRAVIOLETS; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

EID: 18744416826     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1509091     Document Type: Article
Times cited : (39)

References (23)
  • 12
    • 0003494870 scopus 로고
    • edited by J. L. Vossen and W. Kern (Academic, San Diego, CA) Part II-4
    • R. Parsons, in Thin Film Process II, edited by J. L. Vossen and W. Kern (Academic, San Diego, CA, 1991), Part II-4.
    • (1991) Thin Film Process II
    • Parsons, R.1
  • 16
    • 8344231179 scopus 로고
    • edited by J. H. Weaver, C. Krafka, D. W. Lynch, and E. E. Koch (Fachinformationszentrum Energie, Physik, Mathematik GMBH, Karlsruhe, Germany)
    • J. H. Weaver, C. G. Olson, and D. W. Lynch, in Optical Properties ofMetals, edited by J. H. Weaver, C. Krafka, D. W. Lynch, and E. E. Koch (Fachinformationszentrum Energie, Physik, Mathematik GMBH, Karlsruhe, Germany, 1981), p. 263.
    • (1981) Optical Properties of Metals , pp. 263
    • Weaver, J.H.1    Olson, C.G.2    Lynch, D.W.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.