Nanoscale silicon structures by using carbon nanotubes as reactive ion etch masks

Nanotechnology

Volumn 16, Issue 6, 2005, Pages 750-753

  Schmidt, Michael Stenbæk ^a   Nielsen, Theodor ^a   Madsen, Dorte Nørgaard ^a,b   Kristensen, Anders ^a   Bøggild, Peter ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b UNIVERSITY OF BERGEN   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; MACROMOLECULES; MASKS; MOLECULAR STRUCTURE; NANOTECHNOLOGY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE TENSION;

ANISOTROPIC ETCH; MACROMOLECULAR STRUCTURE; MULTIWALLED CARBON NANOTUDES (MWCNT); THERMAL NANOIMPRINT;

SEMICONDUCTING SILICON;

EID: 18744368092     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/6/021     Document Type: Article

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