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Volumn 4502, Issue , 2001, Pages 47-54

Investigation of soft x-ray emission in the 'water window' for microscopy using a double-stream gas puff target irradiated with the Prague Asterix Laser System (PALS)

Author keywords

Gas puff target; Laser applications; Laser produced x ray sources; X ray microscopy; X ray optics

Indexed keywords

HELIUM; IRRADIATION; LASER APPLICATIONS; MICROSCOPIC EXAMINATION; NITROGEN; X RAY DIFFRACTION;

EID: 18644372989     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.449852     Document Type: Conference Paper
Times cited : (14)

References (10)
  • 4
    • 1542702906 scopus 로고    scopus 로고
    • Description of an x-ray microscope with 30 nm resolution
    • R. Medenwaldt, E. Uggerhoj, "Description of an x-ray microscope with 30 nm resolution" Rev. Sci. Instr. 69, 2974 (1998).
    • (1998) Rev. Sci. Instr. , vol.69 , pp. 2974
    • Medenwaldt, R.1    Uggerhoj, E.2
  • 6
    • 0010764958 scopus 로고    scopus 로고
    • private communication
    • T. Wilhein - private communication.
    • Wilhein, T.1
  • 7
    • 0000360517 scopus 로고    scopus 로고
    • X-ray emission in the 'water window' from a nitrogen gas puff target irradiated with a nanosecond Nd: Glass laser pulse
    • H. Fiedorowicz, A. Bartnik, R. Jarocki, M. Szczurek, T. Wilhein, "X-ray emission in the 'water window' from a nitrogen gas puff target irradiated with a nanosecond Nd: glass laser pulse" Appl. Phys. B 67, 391(1998).
    • (1998) Appl. Phys. B , vol.67 , pp. 391
    • Fiedorowicz, H.1    Bartnik, A.2    Jarocki, R.3    Szczurek, M.4    Wilhein, T.5
  • 8
    • 0000951834 scopus 로고    scopus 로고
    • Enhanced x-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup
    • H. Fiedorowicz, A. Bartnik, R. Jarocki, R. Rakowski, M. Szczurek, "Enhanced x-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup" Appl. Phys. B 70, 305 (2000).
    • (2000) Appl. Phys. B , vol.70 , pp. 305
    • Fiedorowicz, H.1    Bartnik, A.2    Jarocki, R.3    Rakowski, R.4    Szczurek, M.5
  • 10
    • 0010763540 scopus 로고    scopus 로고
    • in preparation
    • J. Wawer - in preparation.
    • Wawer, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.