Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 327-337

  Chen, Jerry X ^a   Howard, Charles ^a   Son, Kong ^a   Kalk, Franklin D ^a   Lee, Il Ho ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; DEFECTS; EVALUATION; INSPECTION; SCANNING ELECTRON MICROSCOPY; STANDARDS;

PHOTOMASK INSPECTION SYSTEMS; RUNABILITY; SENSITIVITY; UNIVERSAL INSPECTION STANDARD;

MASKS;

EID: 0033666174     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392032     Document Type: Conference Paper

References (2)