UHV aluminium oxide on silicon substrates: Electron spectroscopies analysis and electrical measurements

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 656-662

  Gruzza, B ^a   Merle, S ^a   Bideux, L ^a   Robert, C ^a   Kover, L ^b   Toth, J ^b   Matolin, V ^c  

^a UNIVERSITÉ BLAISE PASCAL   (France)

^b INSTITUTE OF NUCLEAR RESEARCH ATOMKI   (Hungary)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Electron spectroscopy for chemical analysis; Electronic transport; MIS structures; Thin film growth; Vacuum deposition

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; CAPACITANCE MEASUREMENT; CURRENT VOLTAGE CHARACTERISTICS; FILM PREPARATION; SILICON; SUBSTRATES; THIN FILMS; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRONIC TRANSPORT; VACUUM DEPOSITION;

SEMICONDUCTING FILMS;

EID: 18544404974     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00119-2     Document Type: Article

References (9)

1. Dolata R., Neuhaus M., Jutzi W. Phys. C. 241:1995;25.
2. Capogna L., Costabile G., Barbara P., Martucciello N., Monaco R. Cryogenics. 34:1994;895.
3. Ealet B., Elyakhloufi M.H., Gillet E., Ricci M. Thin Solid Films. 250:1994;92.
4. Fuchs G., Nieman D., Poppa H. Thin Solid Films. 207:1992;65.
5. Matolin V., Nehasil V., Bideux L., Robert C., Gruzza B. Thin Solid Films. 289:1996;295.
6. S. Merle, Thesis No. 1151, Blaise Pascal University, France, 1999.
7. L.E. Davis, N.C. McDonald, P.W. Palmberg, G.E. Riach, R.E. Weber, Handbook of Auger Electron Spectroscopy, 2nd Edition, Physical Electronics, Eden Prairie, MN, 1976.
8. Ascarelli P., Moretti G. Surf. Interf. Anal. 7:1985;8.
9. Terman L.M. Solid State Electr. 5:1962;285.