Fabrication of thin-film LAPS with amorphous silicon

Sensors

Volumn 4, Issue 10, 2004, Pages 163-169

  Yoshinobu, Tatsuo ^a   Schöning, Michael J ^b,c   Finger, Friedhelm ^c   Moritz, Werner ^d   Iwasaki, Hiroshi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b AACHEN UNIVERSITY OF APPLIED SCIENCES   (Germany)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

^d HUMBOLDT UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CURRENT VOLTAGE CHARACTERISTICS; IMAGING TECHNIQUES; PH; SENSITIVITY ANALYSIS; STRENGTH OF MATERIALS; THIN FILMS;

CHEMICAL IMAGING SENSOR; LAPS; PH SENSOR; SEMICONDUCTOR LAYERS;

CHEMICAL SENSORS;

EID: 18544371344     PISSN: 14243210     EISSN: None     Source Type: Journal    
DOI: 10.3390/s41000163     Document Type: Article

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