An oxidation enhanced mechanical polishing technique for CVD diamond films

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 622-625

  Cheng, C Y ^a   Tsai, H Y ^a   Wu, C H ^a   Liu, P Y ^a   Hsieh, C H ^a   Chang, Y Y ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

CVD diamond film; Polishing; Potassium permanganate

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRENGTH; MACHINING; OXIDATION; POLISHING; POTASSIUM COMPOUNDS; SEMICONDUCTING DIAMONDS; SUBSTRATES;

CVD DIAMOND FILMS; MECHANICAL POLISHING; POTTASIUM PERMANGANATE; SYNTHETIC DIAMOND;

DIAMOND FILMS;

EID: 18444396323     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.12.055     Document Type: Conference Paper

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