Thermal properties of CN thin films measured by photothermal methods

Journal of Wide Bandgap Materials

Volumn 8, Issue 3-4, 2001, Pages 233-239

  Bodzenta, Jerzy ^a   Burak, BogusŁaw ^a   Mazur, Jacek ^a   Szmidt, Jan ^b  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Photothermal measurements; Thermal properties; Thin films

Indexed keywords

CARBON NITRIDE; COATINGS; PASSIVATION; SILICON WAFERS; THERMAL CONDUCTIVITY; THERMODYNAMIC PROPERTIES;

INTERCONDUCTOR DIELECTRICS; PASSIVATION LAYERS; PHOTOTHERMAL METHODS; POWER LASER SYSTEMS;

THIN FILMS;

EID: 18444392652     PISSN: 1524511X     EISSN: None     Source Type: Journal    
DOI: 10.1106/152451102024666     Document Type: Article

References (5)

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3. J. Bodzenta, J. Mazur and Z. Kleszczewski, "Photothermal measurements of thermal conductivity of thin amorphous films," J. Chem. Vap. Dep., 5(4): 288-297 (1997).
4. J. Bodzenta, J. Mazur, S. Mitura and P. Niedzielski, "Investigation of DLC coated silicon wafers," J. Chem. Vap. Dep., 3(4): 311-323 (1995).
5. J.E. Graebner, S. Jin, G.W. Kammlott, B. Bacon, L. Seibles and W. Banholzer, "Anisotropic thermal conductivity in chemical vapor deposition diamond," J. Appl. Phys., 71(2): 5353-5356 (1992).