Electrochemical behavior of bimetallic Ni-Ti surface generated by ion implantation

Journal of Materials Research

Volumn 19, Issue 2, 2004, Pages 439-446

  Pham, M T ^a   Maitz, M F ^a   Reuther, H ^a   Richter, E ^a   Matz, W ^a   Muecklich, A ^a   Prokert, F ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BIMETALS; CATALYSIS; CORROSION RESISTANCE; DOPING (ADDITIVES); ELECTROCHEMISTRY; ELECTRODEPOSITION; ION IMPLANTATION; REDOX REACTIONS; SURFACE PHENOMENA; THIN FILMS;

ANODIC OXIDATIONS; ELECTROCATALYTIC OXIDATION;

NICKEL ALLOYS;

EID: 1842766150     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2004.19.2.439     Document Type: Article

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