A silicon bi-layer system

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 22, Issue 1-3, 2004, Pages 72-75

  Takashina, K ^a   Hirayama, Y ^a,b   Fujiwara, A ^a   Horiguchi, S ^a   Takahashi, Y ^a  

^a NTT Basic Research Laboratories   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Bi layer; Silicon; SIMOX; Valley splitting

Indexed keywords

CORRELATION METHODS; CYCLOTRONS; MOSFET DEVICES; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR QUANTUM WELLS; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES;

SEPARATION BY IMPLANTED OXYGEN (SIMOX); WAVE FUNCTIONS;

SEMICONDUCTING SILICON;

EID: 1842634300     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2003.11.219     Document Type: Conference Paper

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