Creation of silicon submicron structures by compression plasma flow action

Vacuum

Volumn 73, Issue 3-4, 2004, Pages 561-566

  Purić, Jagoš ^a,b   Astashynski, Valentin M ^c   Dojčinović, Ivan P ^a   Kuraica, Milorad M ^a,b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b Center for Science and Technology Development   (Serbia)

^c B I STEPANOV INSTITUTE OF PHYSICS   (Belarus)

Author keywords

Compression plasma flow; Plasma surface modification; Silicon nanostructures

Indexed keywords

CARBON NANOTUBES; CARRIER CONCENTRATION; CATALYSTS; CRYSTALS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; SURFACE TREATMENT;

COMPRESSION PLASMA FLOW; PLASMA SURFACE MODIFICATION; SILICON NANOSTRUCTURES;

SILICON;

EID: 1842582444     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.12.087     Document Type: Conference Paper

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