Dose modulation induced mask CD error on simultaneous correction of fogging and loading effect

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 666-672

  Lee, Ho June ^a   Yang, Seung Hune ^a   Park, Jin Hong ^a   Moon, Seong Yong ^a   Choi, Seong Woon ^a   Sohn, Jung Min ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Dose modulation; Fogging; Loading; Variable eta

Indexed keywords

COMPUTER SIMULATION; DATA REDUCTION; ELECTRON BEAMS; ELECTRON SCATTERING; ERROR ANALYSIS; ERROR CORRECTION; ETCHING; LITHOGRAPHY; MODULATION;

DOSE MODULATION; FOGGING; LOADING EFFECTS; PROXIMITY EFFECT CORRECTION (PEC); VARIABLE ETA;

MASKS;

EID: 1842579617     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518283     Document Type: Conference Paper

References (2)

1. nd Annual BACUS Symposium on Photomask Technol.Proceedings of SPIE Vol.4889, p59 (2002)
2. Takashi KAMIKUBO et al., Jpn.J.Appl.Phys.Vol.36 (1997) pp.7546-7551 Part 1, No. 12B