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Volumn 84, Issue 10, 2004, Pages 1638-1640
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Temperature-insensitive Ge-B-SiO2 planar lightwave circuits by inductively coupled plasma-enhanced chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
INDUCTIVELY COUPLED PLASMA;
INTERFEROMETERS;
LASER BEAM EFFECTS;
LIGHT ABSORPTION;
MATHEMATICAL MODELS;
OPTICAL COMMUNICATION;
OPTICAL FILMS;
OPTICAL WAVEGUIDES;
PHOTOLITHOGRAPHY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICA;
SILICON WAFERS;
STAINLESS STEEL;
WAVE PROPAGATION;
FLAME HYDROLYSIS DEPOSITION (FHD);
HIGH QUALITY FILMS;
OPTICAL FILTERS;
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EID: 1842529069
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1664011 Document Type: Article |
Times cited : (4)
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References (14)
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