Comparative evaluation of e-beam sensitive chemically amplified resists for mask making

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 176-187

  Irmscher, Mathias ^a   Beyer, Dirk ^b   Butschke, Joerg ^a   Constantine, Chris ^d   Hoffmann, Thomas ^a   Koepernik, Corinna ^a   Krauss, Christian ^c   Leibold, Bernd ^a   Letzkus, Florian ^a   Mueller, Dietmar ^a   Springer, Reinhard ^a   Voehringer, Peter ^a  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

^b Vistec Electron Beam GmbH   (Germany)

^c STEAG AG   (Germany)

^d Unaxis USA Inc   (United States)

Author keywords

Chemically amplified resist; e beam; Photomask process and materials; Stencil mask

Indexed keywords

AMINES; ELECTRON BEAMS; ETCHING; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS (CAR); PHOTOMASKS;

PHOTORESISTS;

EID: 1842495016     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476944     Document Type: Conference Paper

References (4)

1. C. Constantine, R. Westermann, J. Plumhoff, "Plasma Etch of Binary Cr Masks: CD Uniformity Study of Photomasks Utilizing Varying Cr Loads - Part III", Proc. SPIE, Vol. 4186, pp. 85 - 86, 2000.
2. S. Sasaki, M. Kurihara, H. Mohri, N. Hayashi, P. Dress, A. Nöring, T. Gairing, "CD performance of CA-resists with a dynamically controlled multi-zone bake system", European Mask Conference, Munich, Germany, Jan 15 - 16, 2002, will be published.
3. D. Beyer, D. Löffelmacher, G. Goedl, P. Hudek, B. Schnabel, T. Elster, "Tool and process optimization for 100 nm maskmaking using a 50kV variable shaped e-beam system", BACUS Conference, Monterey, CA, USA, Oct 2 - 5, 2001, will be published.
4. F. Letzkus, J. Butschke, B. Hoefflinger, M. Irmscher, C. Reuter, R. Springer, A. Ehrmann, J. Mathuni, "Dry Etch Improvements in the SOI Wafer Flow Process for IPL Stencil Mask Fabrication", Microelectronic Engineering 53 (2000) 609-612.