Plasma Etch of Binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads- Part III

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 85-86

  Constantine, C ^a   Westermann, R ^a   Plumhoff, J ^a  

^a Unaxis USA Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; FINITE ELEMENT METHOD; INDUCTIVELY COUPLED PLASMA; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY;

HARDWARE CONFIGURATIONS; PLASMA UNIFORMITY;

MASKS;

EID: 0035043125     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410745     Document Type: Article

References (0)