Electron beam induced secondary emission changes investigated by work function spectroscopy

Applied Surface Science

Volumn 227, Issue 1-4, 2004, Pages 87-93

  Vida, Gy ^a   Beck, I ^a   Josepovits, V K ^a   Gyor, M ^b   Deak P ^a  

^a BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

^b GE Hungary Co Ltd   (Hungary)

Author keywords

Mean free path; Secondary emission; Silicon; Tungsten; Work function

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ION BOMBARDMENT; IRRADIATION; SCANNING ELECTRON MICROSCOPY; SILICON; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

MEAN FREE PATH; SECONDARY EMISSIONS; WORK FUNCTION SPECTROSCOPY;

SURFACE PHENOMENA;

EID: 1842425210     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.11.027     Document Type: Article

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