Measurement of oxide film growth on Mg and Al surfaces over extended periods using XPS

Surface Science

Volumn 382, Issue 1-3, 1997, Pages

  Chen, C ^a   Splinter, S J ^a   Do, T ^a   McIntyre, N S ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

Aluminum; Magnesium; Oxidation; Polycrystalline surfaces; Water; X ray photoelectron spectroscopy

Indexed keywords

ALUMINUM; CHEMICAL MODIFICATION; FILM GROWTH; HYDRATION; MAGNESIUM; OXIDATION; OXIDES; SURFACE STRUCTURE; SURFACE TREATMENT; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

LOGARITHMIC OXIDE GROWTH KINETICS;

POLYCRYSTALLINE MATERIALS;

EID: 0031167147     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00054-X     Document Type: Article

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