Plasma diagnostics in a double inductively coupled source (DICP) for plasma sterilisation

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 570-573

  Messerer, P ^a   Boenigk, B ^a   Keil, G ^a   Scheubert, P ^a   Awakowicz, P ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

DICP; Model; Sterilisation

Indexed keywords

ELECTRODYNAMICS; ELECTROHYDRODYNAMICS; ELECTROLYTIC POLISHING; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PLASMA SIMULATION; TRANSPORT PROPERTIES; ULTRAHIGH MOLECULAR WEIGHT POLYETHYLENES;

STERLIZATIONS;

PLASMA DIAGNOSTICS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144435870     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00630-3     Document Type: Article

References (4)

1. Scheubert P. Fantz U. Awakowicz P. Paulin H. Experimental and theoretical characterization of an inductively coupled plasma source J. Appl. Phys. 90 2 2001 587-598
2. Electron kinetics and applications of glow discharges Kortshagen U. Tsendin L.D. Chapter Optical Characterisation of RF Inductively Coupled Plasmas 1998 489 Plenum Press New York
3. P. Pecher, Thesis, Univ. Bayreuth (1997)
4. J. Feichtinger, Proceedings of the Eight International Conference on Plasma Surface Engineering (2002), to be printed