Fabrication of 3-D microstructures with a catalytic surface composed of an ion-implanted layer

Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 364-368

  Nakano, Shizuka ^a   Ogiso, H ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chemical etching; Gold; Ion implantation; Nanostructure; Scanning electron microscopy (SEM); Silicon

Indexed keywords

CATALYSTS; CHEMICAL REACTORS; ETCHING; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; OPTIMIZATION; SILICON; SUBSTRATES; SURFACE ROUGHNESS;

CATALYST FABRICATION; MICROTOTAL ANALYSIS; SURFACE ETCHING; WATERCOURSES;

MICROSTRUCTURE;

NANOSTRUCTURE;

EID: 18144401952     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.160     Document Type: Article

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