Ionization enhancement of zirconium atoms in inductively coupled discharge

Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 188-191

  Nakamura, Keiji ^a   Yoshinaga, Hiroaki ^b   Yukimura, Ken ^b  

^a CHUBU UNIVERSITY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

Inductively coupled discharge; Ion flux fraction; Sputtering; Zirconium ion

Indexed keywords

ARGON; CARRIER CONCENTRATION; DEPOSITION; ELECTRIC DISCHARGES; MASS SPECTROMETRY; ZIRCONIUM;

DISCHARGE POWER; INDUCTIVELY COUPLED ARGON DISCHARGE; IONIZATION ENHANCEMENT; OPTIMAL PRESSURE;

IONIZATION;

ZIRCONIUM;

EID: 18144388629     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.125     Document Type: Article

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