Effects of As + -implantation on the formation of iron silicides in Fe thin films on (1 1 1)Si

Applied Surface Science

Volumn 212-213, Issue SPEC., 2003, Pages 204-208

  Lu, H T ^a   Chueh, Y L ^a   Chou, L J ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

As + implantation; FeSi; FeSi 2

Indexed keywords

ARSENIC; ENERGY DISPERSIVE SPECTROSCOPY; GRAIN BOUNDARIES; ION IMPLANTATION; PHASE TRANSITIONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

SHEET RESISTANCE MEASUREMENTS;

IRON COMPOUNDS;

EID: 17944394349     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00363-5     Document Type: Conference Paper

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