Gas bubbles in beryllium implanted with He ions at temperatures ≤ 700 K and after post-implantation annealing

Journal of Nuclear Materials

Volumn 258-263, Issue PART 1 A, 1998, Pages 694-699

  Chernikov, V N ^a   Ullmaier, H ^b   Zakharov, A P ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; DEUTERIUM; DISSOCIATION; HELIUM; ION IMPLANTATION; POROSITY; THERMOANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

POST-IMPLANTATION ANNEALING;

BERYLLIUM;

EID: 17944386159     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(98)00250-5     Document Type: Article

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