Photo-orientation of mesoporous silica thin films on photocrosslinkable polymer films

Advanced Materials

Volumn 17, Issue 8, 2005, Pages 1035-1039

  Fukumoto, Haruhiko ^a   Nagano, Shusaku ^a   Kawatsuki, Nobuhiro ^b   Seki, Takahiro ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; IRRADIATION; LIQUID CRYSTALS; MESOPOROUS MATERIALS; POLARIZATION; POLYMERS; SILICA; SOLS; SOLUTIONS; SURFACE ACTIVE AGENTS; THIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

LINEARLY POLARIZED UV (LPUV) LIGHT; MESOPOROUS SILICA; PHOTO-ORIENTATION; PHOTOALIGMENT LAYERS;

PHOTOCHEMICAL REACTIONS;

EID: 17844386366     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200401418     Document Type: Article

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