IMPULSE - A new approach to process design

Chemical Engineering and Technology

Volumn 28, Issue 4, 2005, Pages 431-438

  Bayer, Thomas ^a   Jenck, Jean ^b   Matlosz, Michael ^c  

^a SIEMENS AG   (Germany)

^b ENKI Innovation ^*  (France)

^c UNIVERSITÉ DE LORRAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL EQUIPMENT; CHEMICAL INDUSTRY; COMPETITION; PROCESS ENGINEERING;

CHEMICAL PROCESS DESIGN; PROCESS INDUSTRIES; PRODUCTION EQUIPMENT;

CHEMICAL ENGINEERING;

PROCESSING TECHNIQUE;

EID: 17844386352     PISSN: 09307516     EISSN: None     Source Type: Journal    
DOI: 10.1002/ceat.200407120     Document Type: Article

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