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Volumn 55, Issue 3, 2005, Pages 319-325

An efficient venturi scrubber system to remove submicron particles in exhaust gas

Author keywords

[No Author keywords available]

Indexed keywords

WATER; SILICON DERIVATIVE; SILICON DIOXIDE;

EID: 17844377631     PISSN: 10962247     EISSN: 21622906     Source Type: Journal    
DOI: 10.1080/10473289.2005.10464622     Document Type: Article
Times cited : (33)

References (14)
  • 1
    • 0000947851 scopus 로고
    • Collection of Aerosols in a Venturi Scrubber
    • Ekman, F.O., Johnstone, H.F. Collection of Aerosols in a Venturi Scrubber; Ind. Eng. Chem. 1951, 43, 1358.
    • (1951) Ind. Eng. Chem , vol.43 , pp. 1358
    • Ekman, F.O.1    Johnstone, H.F.2
  • 2
    • 0014782079 scopus 로고
    • Other Atomizing Scrubbers Efficiency and Pressure Drop
    • Calvert, S. Venturi and Other Atomizing Scrubbers Efficiency and Pressure Drop; AICHE J. 1970, 16, 392.
    • (1970) AICHE J , vol.16 , pp. 392
    • Calvert, S.V.1
  • 3
    • 0018040183 scopus 로고
    • Dust Collection in Venturi Scrubbers
    • Mayinger, F., Neumann, M. Dust Collection in Venturi Scrubbers; Ger. Chem. Eng. 1978, 1, 289.
    • (1978) Ger. Chem. Eng , vol.1 , pp. 289
    • Mayinger, F.1    Neumann, M.2
  • 4
    • 0021428997 scopus 로고
    • Experiments With Highly Efficient Venturi Scrubbers for Aerosol Separation From Gases Under Multi-Plane Water Injection
    • Tigges, K.D., Mayinger, F. Experiments With Highly Efficient Venturi Scrubbers for Aerosol Separation From Gases Under Multi-Plane Water Injection; Chem. Eng. Proces. 1984, 18, 171.
    • (1984) Chem. Eng. Proces , vol.18 , pp. 171
    • Tigges, K.D.1    Mayinger, F.2
  • 6
    • 0030251530 scopus 로고    scopus 로고
    • Treating Semiconductor Emissions with Point-of-Use Abatement Systems
    • Oct
    • Hayes, M., Woods, K. Treating Semiconductor Emissions with Point-of-Use Abatement Systems; Solid State Technol. 1996, Oct, 141.
    • (1996) Solid State Technol , pp. 141
    • Hayes, M.1    Woods, K.2
  • 9
    • 0030873586 scopus 로고    scopus 로고
    • White Smoke Emission From a Semiconductor Manufacturing Plant
    • Tsai, C.J., Miao, C.C., Lu, H.C. White Smoke Emission From a Semiconductor Manufacturing Plant; Environ. Inter. 1997, 23, 489.
    • (1997) Environ. Inter , vol.23 , pp. 489
    • Tsai, C.J.1    Miao, C.C.2    Lu, H.C.3
  • 11
    • 0026868998 scopus 로고
    • Nucleation Process for the Separation of Fine Particles From Flue Gas
    • Chen, C.C., Wu, M.C.A. Nucleation Process for the Separation of Fine Particles From Flue Gas; Chem. Eng. Sci. 1992, 47, 1581.
    • (1992) Chem. Eng. Sci , vol.47 , pp. 1581
    • Chen, C.C.1    Wu, M.C.A.2
  • 12
    • 0027531092 scopus 로고
    • Nucleation-Assisted Process for the Removal of Fine Aerosol Particles
    • Chen, C.C., Shu, H.K., Yang, Y.K. Nucleation-Assisted Process for the Removal of Fine Aerosol Particles; Ind. & Eng. Chem. Res. 1993, 32, 1509.
    • (1993) Ind. & Eng. Chem. Res , vol.32 , pp. 1509
    • Chen, C.C.1    Shu, H.K.2    Yang, Y.K.3
  • 14
    • 0002750686 scopus 로고
    • An Experiment on the Atomization of Liquid by Means of air Stream
    • Nukiyama, S., Tanasawa, Y. An Experiment on the Atomization of Liquid by Means of air Stream; Trans. Soc. Mech. Eng. 1938, 4, 86.
    • (1938) Trans. Soc. Mech. Eng , vol.4 , pp. 86
    • Nukiyama, S.1    Tanasawa, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.