Electrical properties of carbon black and ruthenium dioxide embedded silica films

Journal of Sol-Gel Science and Technology

Volumn 32, Issue 1-3, 2004, Pages 131-135

  Hubert Th ^a   Shimamura, A ^a   Klyszcz, A ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

Carbon black; Percolation phenomena; Ruthenium dioxide; Sol gel; Thin films

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; HYDROLYSIS; PERCOLATION (FLUIDS); RUTHENIUM COMPOUNDS; SILICA; SOL-GELS; TEMPERATURE DISTRIBUTION; THIN FILMS;

ELECTRICAL PROPERTIES; PERCOLATION PHENOMENA; POLYMER COMPOSITIONS; SILICA FILMS;

CARBON BLACK;

EID: 17744398442     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-004-5777-5     Document Type: Conference Paper

References (14)

1. W.L. Warren, et al., Mat. Res. Soc. Symp. Proc. 180, 413 (1990).
2. S. Sakka and H. Kozuka, J. Sol-Gel Sci. Technol. 13, 701 (1998).
3. T. Lutz, C. Estournes, and J. L. Guille, J. Sol-Gel Sci. Technol. 13, 929 (1998).
4. L. Fladin, et al., Phys. Rev. B 59, 22, 14349 (1999).
5. M.I. Prodromidis and M.I. Karayannis, Electroanalysis 14, 241 (2002).
6. K. Fujiki, T. Ogasawara, and N. Tsubokawa, J. Mat. Sci. 33, 1871 (1998).
7. H. Over, Appl. Phys. A 75, 37 (2002).
8. M. Guglielmi, et al., J. Electrochem. Soc. 139, 1655 (1992).
9. T. Yamaguchi and Y. Nakamura, J. Am. Ceram. Soc. 78, 1372 (1995).
10. J.F. Tressler, K. Watanabe, and M. Tanaka, J. Am. Ceram. Soc. 79, 525 (1996).
11. A. Shimamura, Th. Hübert, and H. Thust, Surface and Interface Analysis, xx (2004).
12. S. Nakamura, K. Saito, G. Sawa, and K. Kitagawa, Jpn. J. Appl. Phys. 36, 5163 (1997).
13. A. Kusy and E. Listkiewicz, Solid-State Electronics 31, 821 (1988).
14. A. Shimamura, Thesis, Technical University of Ilmenau, 2003.