SCOPUS 정보 검색 플랫폼

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 2, 2005, Pages 599-606

Numerical simulation applied to chemical vapour deposition process. Rapid Thermal CVD and Spray CVD

Author keywords

Chemical Vapour Deposition; Numerical simulation; Rapid Thermal Process; Spray CVD

Indexed keywords

BOUNDARY LAYERS; COMPUTER SIMULATION; EQUATIONS OF MOTION; HEAT TREATMENT; MATHEMATICAL MODELS; MICROELECTRONICS; OPTOELECTRONIC DEVICES; PROTECTIVE COATINGS; SPRAYING; THIN FILMS;

CHEMICAL CONCENTRATION BOUNDARY LAYERS; RAPID THERMAL PROCESS; SPRAY CVD; THIN FILM DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 17744380954 PISSN: 14544164 EISSN: None Source Type: Journal
DOI: None Document Type: Conference Paper

Times cited : (9)

References (18)

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6
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.