La-substitution Bi2Ti2O7 thin films grown by chemical solution deposition

Materials Research Bulletin

Volumn 40, Issue 5, 2005, Pages 724-730

  Yang, Xuena ^a   Wang, Hongbin ^b   Huang, Baibiao ^a   Shang, Shuxia ^a  

^a SHANDONG UNIVERSITY   (China)

^b QILU UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

A. thin films; C. X ray diffraction; D. dielectric properties

Indexed keywords

BISMUTH COMPOUNDS; CAPACITORS; DEPOSITION; LANTHANUM; PERMITTIVITY; SUBSTITUTION REACTIONS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

BREAKDOWN STRENGTH; CHEMICAL SOLUTION DEPOSITION; DIELECTRIC BREAKDOWN STRENGTH; STORAGE CAPACITORS;

THIN FILMS;

EID: 17744371445     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2005.02.012     Document Type: Article

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