Requirements on amorphous semiconductors for medical X-ray detectors

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 132-136

  Hoheisel, Martin ^a   Bätz, Lothar ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; IMAGE ANALYSIS; IMAGE QUALITY; RADIATION DETECTORS; SIGNAL TO NOISE RATIO; X RAYS;

MEDICAL X-RAY DETECTORS; MICROCALCIFICATIONS;

SEMICONDUCTING FILMS;

EID: 17644449328     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01592-3     Document Type: Article

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