Fabrication of uniform poly-Si thin film on glass substrate by AIC

Thin Solid Films

Volumn 451-452, Issue , 2004, Pages 485-488

  Doi, Atsutoshi ^a  

^a KINKI UNIVERSITY   (Japan)

Author keywords

Crystallization; Diffusion; Glass; Silicon

Indexed keywords

ALUMINUM; ANNEALING; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; DIFFUSION; DISSOLUTION; HEATING; INTERFACES (MATERIALS); LIQUID PHASE EPITAXY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SURFACE REACTIONS; SURFACE ROUGHNESS;

ALUMINUM INDUCED CRYSTALLIZATION (AIC); ENDOTHERMIC REACTIONS;

THIN FILM DEVICES;

EID: 17644434096     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.131     Document Type: Conference Paper

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