Aging of plasma-deposited carbon layers: Effect of their thickness and material structure

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 216-220

  Clergereaux, R ^a   Escaich, D ^a   Martin, S ^b   Gaillard, F ^b   Raynaud, P ^a  

^a Natl Sup d'Electrotechnique d'Electronique d'Informatique et d'Hydraulique de Toulouse   (France)

^b CEA GRENOBLE   (France)

Author keywords

Aging; Carbon layer; Plasma deposition; Structural properties

Indexed keywords

AGING OF MATERIALS; ANODES; CAPACITANCE; CATHODES; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTRONICS; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

CARBON LAYERS; PLASMA DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY (SE); STRUCTURAL PROPERTIES;

CARBON;

EID: 17644418741     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.148     Document Type: Conference Paper

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