Thickness determination of thin (∼20 nm) microcrystalline silicon layers

Solar Energy Materials and Solar Cells

Volumn 87, Issue 1-4, 2005, Pages 445-455

  Gordijn, A ^a   Loffler J ^a   Arnoldbik, W M ^a   Tichelaar, F D ^b   Rath, J K ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Amorphous silicon; Microcrystalline silicon; Optical characterization; Thickness

Indexed keywords

CRYSTALS; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SPECTROSCOPIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

DEPOSITION RATE; MICROCRYSTALLINE SILICON; OPTICAL CHARACTERIZATION; THICKNESS;

AMORPHOUS SILICON;

EID: 17644409386     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.09.016     Document Type: Conference Paper

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