Polishing and surface characterization of SiC substrates

Materials Science Forum

Volumn 338, Issue , 2000, Pages

  Everson, V J ^a   Snyder, D W ^a   Heydemann, V D ^a  

^a II VI Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; POLISHING; POTASSIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS;

NON-CONTACT SURFACE PROFILOMETRY; PHOTON BACKSCATTERING TECHNIQUES;

SILICON CARBIDE;

EID: 17544396432     PISSN: 02555476     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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6. SEMI M3-91, Specifications for polished monocrystalline sapphire substrates, 1996