Ion beam analysis of sputter-deposited gold films for quartz resonators

Surface and Interface Analysis

Volumn 30, Issue 1, 2000, Pages 620-622

  Bergsaker H ^a   Ilyinsky, L ^a   Portnoff, G ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b Quartz Pro AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTAL RESONATORS; FILM GROWTH; GOLD; ION BEAMS; MAGNETRON SPUTTERING; METALLIC FILMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

ARGON TRAPPING; QUARTZ RESONATORS;

SPUTTER DEPOSITION;

EID: 17544393001     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200008)30:1<620::AID-SIA838>3.0.CO;2-4     Document Type: Article

References (4)

1. Windischmann H. Crit. Rev. Solid State Mater. Sci. 1992; 17: 547.
2. Thornell G, Ericson F, Portnoff G. IEEE Trans. Ultrason. Ferroel. Freq. Contr. 1999; 46: 981.
3. Bay HL. In Sputtering by Particle Bombardment I, Behrisch R (ed.). Springer: Berlin, 1981; 188.
4. Ziegler JF, Biersack JP. The Stopping and Ranges of Ions in Solids. Pergamon: New York, 1985.