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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 1-7, 2005, Pages

Selective removal of carbon nanotubes utilizing low-acceleration-voltage electron irradiation damage

(4) Suzuki, Satoru a Takagi, Daisuke b Homma, Yoshikazu b Kobayashi, Yoshihiro a

a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories (Japan)

b TOKYO UNIVERSITY OF SCIENCE (Japan)

Author keywords

Electron irradiation damage; Low acceleration voltage electron; Nanotube; Selective removal

Indexed keywords

ANNEALING; BINDING ENERGY; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON IRRADIATION; GROWTH KINETICS; NANOTUBES; OSCILLATIONS; RADIATION DAMAGE; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY;

ELECTRON IRRADIATION DAMAGE; LOW-ACCELERATION-VOLTAGE ELECTRONS; SELECTIVE REMOVAL; SINGLE-WALLED CARBON NANOTUBES (SWNT);

CARBON NANOTUBES;

EID: 17544362084 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.44.L133 Document Type: Article

Times cited : (16)

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