Temperature dependence of the negative bias temperature instability in the framework of dispersive transport

Applied Physics Letters

Volumn 86, Issue 14, 2005, Pages 1-3

  Kaczer, B ^a   Arkhipov, V ^a   Degraeve, R ^a   Collaert, N ^a   Groeseneken, G ^a,c   Goodwin, M ^a,b  

^a IMEC   (Belgium)

^b TEXAS INSTRUMENTS   (United States)

^c Katholieke Universiteit Leuven   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSIVE TRANSPORT; GATE OXIDES; NEGATIVE BIAS TEMPERATURE INSTABILITY (NBTI); TEMPERATURE DEPENDENCE;

DIFFUSION; ELECTRIC POTENTIAL; FUNCTIONS; GATES (TRANSISTOR); HYDROGEN; MATHEMATICAL MODELS; SILICA; THERMAL EFFECTS;

FIELD EFFECT TRANSISTORS;

EID: 17444419352     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1897046     Document Type: Article

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