In-plaue gravity loading of a circular membrane

Journal of Applied Mechanics, Transactions ASME

Volumn 67, Issue 4, 2000, Pages 837-839

  Tejeda, R O ^a   Lovell, E G ^a   Engelstad, R L ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 17444406800     PISSN: 00218936     EISSN: 15289036     Source Type: Journal    
DOI: 10.1115/1.1308581     Document Type: Article

References (4)

1. Gross, G., 1997, “Ion Projection Lithography: Next Generation Technology?,” J. Vac. Sci. Technol., B15, No. 6, pp. 2136-2138.
2. Tejeda, R., Engelstad, R., Lovell, E., and Berry, I., 1998, “Analysis, Design, and Optimization of Ion-Beam Lithography Masks,” Proc. SPIE, Emerging Lithographic Technologies 2, 3331, pp. 621-628.
3. Michell, J. H., 1899, “On the Direct Determination of Stress in an Elastic Solid, With Application to the Theory of Plates,” Proc. London Math. Soc., 31, pp. 100-124.
4. Timoshenko, S. P., and Goodier, J. N., 1970, Theory of Elasticity, 3rd Ed., McGraw-Hill, New York, pp. 132-135.