Analysis, design, and optimization of ion-beam lithography masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 621-628

  Tejeda, Richard O ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Berry, Ivan L ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Design and analysis; Finite element modeling; In plane distortion; Ion beam lithography; Lithographic masks; Optimization

Indexed keywords

FINITE ELEMENT METHOD; ION BEAM LITHOGRAPHY; OPTIMIZATION; X RAY OPTICS;

LITHOGRAPHIC MASKS;

MASKS;

EID: 0032402870     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309624     Document Type: Conference Paper

References (8)

1. Mechanical distortions of support frames for X-ray lithography masks
2. Analysis and optimization of X-ray masks using finite element methods
3. Optimization of an X-ray mask design for use with horizontal and vertical kinematic mounts
4. Optimal design of an X-ray lithography mask
5. Mechanical response of X-ray masks
6. Practical considerations in X-ray mask mounting methodology