High-efficiency, dielectric multilayer gratings optimized for manufacturability and laser damage threshold

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 511-520

  Britten, Jerald A ^a   Perry, Michael D ^a   Shore, Bruce W ^a   Boyd, Robert D ^a   Loomis, Gary E ^a   Chow, Robert ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Diffraction gratings; Laser damage; Multilayers; Pulse compression; Ultrashort pulse lasers

Indexed keywords

DIFFRACTION; DIFFRACTION EFFICIENCY; DIFFRACTION GRATINGS; LASER DAMAGE; LASER PRODUCED PLASMAS; LASER PULSES; LASERS; LIGHT; LIGHT PROPAGATION; MULTILAYERS; OPTICAL MATERIALS; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; PROCESSING; PULSE COMPRESSION; REACTIVE ION ETCHING; THICKNESS MEASUREMENT; ULTRASHORT PULSES;

AMPLIFIED LASER PULSES; DAMAGE THRESHOLDS; DESIGN PARAMETERS; DIELECTRIC MULTILAYERS; ETCHED GRATINGS; EXPERIMENTAL DATUMS; INTENSITY LASERS; INTERFERENCE LITHOGRAPHIES; LASER CHAINS; MANUFACTURABILITY; MODEL PREDICTIONS; MULTILAYER DIELECTRIC GRATINGS; MULTILAYER STACKS; NEW OPPORTUNITIES; PETAWATT; PHOTORESIST GRATINGS; REACTIVE IONS; TERAWATT; TERAWATT LASERS;

PULSED LASER APPLICATIONS;

EID: 57849117488     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240380     Document Type: Conference Paper

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