Gate oxide metrology and silicon piezooptics

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 261-265

  Zollner, Stefan ^a   Liu, Ran ^a   Volinsky, A A ^a   White, Ted ^a   Nguyen, Bich Yen ^a   Cook, C S ^b  

^a MOTOROLA INC   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

Gate oxide metrology; Piezo optic tensor; Spectroscopic ellipsometry; Strained Si

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELLIPSOMETRY; GATES (TRANSISTOR); OPTICAL PROPERTIES; PIEZOELECTRICITY; SILICON ON INSULATOR TECHNOLOGY; SPECTROSCOPIC ANALYSIS; SUBSTRATES;

GATE OXIDE METROLOGY; PIEZO-OPTIC TENSORS; SPECTROSCOPIC ELLIPSOMETRY; STRAINED SILICON;

SEMICONDUCTING SILICON;

EID: 17144454105     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.276     Document Type: Conference Paper

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