KrF laser CVD of chromium oxide by photodissociation of Cr(CO)6

Materials Science Forum

Volumn 455-456, Issue , 2004, Pages 20-24

  Sousa, P M ^a   Silvestre, A J ^b   Popovici, N ^a   Parames M L ^a   Conde, O ^a  

^a UNIVERSITY OF LISBON   (Portugal)

^b INSTITUTO SUPERIOR DE ENGENHARIA DE LISBOA   (Portugal)

Author keywords

Chromium dioxide (CrO2); Laser CVD; Spintronic

Indexed keywords

BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; CHROMIUM COMPOUNDS; ENERGY DISPERSIVE SPECTROSCOPY; FERROMAGNETIC MATERIALS; FLUORINE; MATERIALS SCIENCE; OXIDATION; PARAMETER ESTIMATION; PARTIAL PRESSURE; PHOTODISSOCIATION; PHOTOLYSIS; RAMAN SCATTERING;

CHROMIUM DIOXIDE (CRO2); HIGH-RATE COATINGS; LASER CVD; SPINTRONIC;

KRYPTON;

EID: 17144452449     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (18)

1. G.A. Prinz, Physics Today Vol. 48 No. 4 (1995), p. 58.
2. D. Grundler, Physics World Vol. 15 No. 4 (2002), p. 39.
3. M.A. Korotin, V.I. Anisimov, D.I. Khomskii and G.A. Sawatzki, Phys. Rev. Lett. Vol. 80 (1998), p. 4305.
4. R.J. Soulen Jr., J. M. Byers, M.S. Osofsky, B. Nadgomy, T. Ambrose, S.F. Cheng, P.R. Broussard, C.T. Tanaka, J. Nowak, J.S. Moodera, A. Barry, and J.M.D. Coey, Science Vol. 282 (1998), p. 85.
5. Y. Ji, G.J. Strijkers, F.Y. Yang, C.L. Chien, J.M. Byers, A. Anguelouch, G. Xiao and A. Gupta, Phys. Rev. Lett. Vol. 86 (2001), p. 5585.
6. A.M. Bratkovky, Phys. Rev. B Vol. 56 (1997), p. 2344.
7. S. Ishibashi, T. Namikawa and M. Satou, Jpn. J. Apll. Phys. Vol. 17 (1978), p. 249.
8. K. Suzuki and P.M. Tedraw, Phys. Rev B Vol. 58 (1998), p. 11597.
9. K. Suzuki and P.M. Tedraw, Apll. Phys. Lett. Vol. 74 (1999), p. 428.
10. X.W. Li, A. Gupta, T.R. McGuire, P.R. Duncombe and G. Xiao, JAP Vol. 85 (1999), p. 5585.
11. M. Rabe, J. Pommer, K. Samm, B. Özyilmaz, C. König, M. Fraune, U. Rüdiger, G. Güntherodt, S. Senz and D. Hess, J. Phys.: Condens. Matter Vol. 4 (2002), p. 7.
12. P.A. Dowben, Y.G. Kim, S. Baral-Tosh, G.O. Ramseyer, C. Hwang and M. Onellion, J. Appl. Phys. Vol. 67 (1990), p. 5658.
13. F.K. Perkins, C. Hwang, M. Onllion, Y.-G. Kim and P.A. Dowben, Thin Solid Films Vol. 198 (1991), p. 317.
14. R. Cheng, C.N. Borca, P.A. Dowben, S. Stadier and Y.U. Idzerda, APL Vol. 78 (2001), p. 521.
15. M. Rothschild, in Laser Microfabrication: Thin Film Processes and Lithography, D.J. Ehrlich and J.Y. Tsao (Eds.), Academic Press, Boston, 1989, p.163.
16. G.W. Tyndall and R.L. Jackson, J. Chem. Phys. Vol. 91 (1989), p. 2881.
17. J. Zuo, C. Xu, B. Hou, C. Wang, Y. Xie and Y. Qian, J. Raman Spect. Vol. 27 (1996), p. 921.
18. M.N. Lliev, A.P. Litvinchuk, H.-G. Lee and C.W. Chu, Phys. Rev. B Vol. 60 (1999), p. 33.