Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 798-803

  Boher, P ^a   Evrard, P ^a   Condat, O ^a   Dos Reis, C ^a   Defranoux, C ^a   Piel, J Ph ^a   Stehle, J L ^a   Bellandi, E ^b  

^a SOPRA   (France)

^b STMICROELECTRONICS   (Italy)

Author keywords

157 nm Lithography; Antireflective coatings; Grazing X ray reflectance; High k dielectrics; Spectroscopic ellipsometry; VUV

Indexed keywords

ANTIREFLECTION COATINGS; BLEACHING; COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELLIPSOMETRY; LITHOGRAPHY; MONOCHROMATORS; MULTILAYERS; SILICA; SILICON; THIN FILMS; ULTRAVIOLET SPECTROSCOPY;

157 NM LITHOGRAPHY; GRAZING X-RAY REFLECTANCE; HIGH K DIELECTRICS; SPECTROSCOPIC ELLIPSOMETRY; VUV;

MICROELECTRONICS;

EID: 17144442893     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.006     Document Type: Conference Paper

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