The ideal vehicle for optical model development: Porous silicon multilayers

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 535-539

  Volk, J ^a   Fried, M ^a   Toth A L ^a   Barsony I ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Interface roughness; Multilayer modelling; Porous silicon; Spectroscopic ellipsometry

Indexed keywords

BIOMATERIALS; CRYSTALLINE MATERIALS; ELLIPSOMETRY; INTERFACES (MATERIALS); MULTILAYERS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS;

FIELD EMISSION SCANNING ELECTRON MICROSCOPY (FESEM); INTERFACE ROUGHNESS; MULTILAYER MODELING; SPECTROSCOPIC ELLIPSOMETRY;

POROUS SILICON;

EID: 17144439018     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.025     Document Type: Conference Paper

References (5)

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