Ellipsometric and XPS analysis of the interface between silver and SiO 2, TiO2 and SiNx thin films

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 468-472

  Masetti, E ^a   Bulir, J ^a,b   Gagliardi, S ^a   Janicki, V ^a   Krasilnikova, A ^c   Di Santo, G ^c   Coluzza, C ^c  

^a ENEA   (Italy)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c SAPIENZA UNIVERSITY OF ROME   (Italy)

Author keywords

Ellipsometry; Interfaces; Silver; XPS

Indexed keywords

ELLIPSOMETRY; FREQUENCIES; INTERFACES (MATERIALS); OPTICAL FILTERS; SILICA; SILICON NITRIDE; SILVER; SPUTTERING; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES; MULTILAYER STRUCTURES; RADIO FREQUENCY SPUTTERING; TRANSMITTANCE FILTERS;

THIN FILMS;

EID: 17144437323     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.244     Document Type: Conference Paper

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