Taguchi methods to optimize TiN coating surface roughness

Materials Science Forum

Volumn 471-472, Issue , 2004, Pages 891-894

  Yim, S L ^a   Yu, K M ^a   Kwok, D ^b   Lee, T C ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b Unit 6   (Hong Kong)

Author keywords

Optimization; PVD coating; Roughness; Taguchi method; Titanium nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; CUTTING; ELECTROCHEMICAL ELECTRODES; OPTIMIZATION; PARAMETER ESTIMATION; PHYSICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; TITANIUM NITRIDE;

ARC CURRENT; CATHODIC ARC PHYSICAL VAPOR DEPOSITION (CAPVD); PVD COATING; TAGUCHI METHODS; TARGET MATERIALS;

POWDER COATINGS;

EID: 17144425413     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.471-472.891     Document Type: Conference Paper

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