Industrial applications of poly-silicon-germanium as functional MEMS material

Proceedings - Electrochemical Society

Volumn 7, Issue , 2004, Pages 1001-1013

  Fuchs, Tino ^a   Leinenbach, Christina ^a   Kronmueller, Silvia ^a   Laermer, Franz ^a   Thomas, Tudor ^c   Robb, Kenneth ^c   Seidel, Helmut ^d   Frev, Wilhelm ^b  

^a ROBERT BOSCH GMBH   (Germany)

^b BOSCH RESEARCH AND TECHNOLOGY CENTER   (United States)

^c Surface Technology Systems Plc   (United Kingdom)

^d SAARLAND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; DEPOSITION; GERMANIUM; GYROSCOPES; MICROELECTROMECHANICAL DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON ALLOYS; TEMPERATURE DISTRIBUTION; THIN FILMS;

MANUFACTURING COSTS; MELTING POINTS; POLYCRYSTALLINE TEXTURES; STRESS GRADIENT;

POLYSILICON;

EID: 17144418585     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. C. Rusu et al., Journal of Microelectromechanical Systems 12 (2003), 816-824.
2. J. Tsai et al., J. Eletrochemical Society 142, no. 9 (1995), 3220-3225.
3. G Ganguly et al., Journal of Non-Crystalline Solids 227-230 (1998), 1069-1073