Inner-shell excitation spectroscopy and X-ray photoemission electron microscopy of adhesion promoters

Journal of Physical Chemistry B

Volumn 109, Issue 13, 2005, Pages 6343-6354

  Tulumello, David ^a   Cooper, Glyn ^a   Koprinarov, Ivo ^a   Hitchcock, Adam P ^a,b   Rightor, Edward G ^c   Mitchell, Gary E ^c   Rozeveld, Steve ^c   Meyers, Greg F ^c   Stokich, Ted M ^c  

^a MCMASTER UNIVERSITY   (Canada)

^b UNIVERSITY OF TORONTO   (Canada)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTATIONAL METHODS; ELECTRON ENERGY LOSS SPECTROSCOPY; LIGHT SCATTERING; OPTIMIZATION; PHOTOEMISSION; THIN FILMS;

ADHESION PROMOTERS; EXCITATION SPECTRA; NEAR EDGE X-RAY ABSORPTION SPECTROSCOPY (NEXAFS); X-RAY PHOTOEMISSION ELECTRON MICROSCOPY (X-PEEM);

SILANES;

ADHESIVE AGENT; SILANE DERIVATIVE; VINYLTRIETHOXYSILANE;

ARTICLE; CHEMISTRY; ELECTRON MICROSCOPY; SPECTROSCOPY; X RAY;

ADHESIVES; MICROSCOPY, ELECTRON; SILANES; SPECTRUM ANALYSIS; X-RAYS;

EID: 17044422088     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp050201v     Document Type: Article

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