Alignment of nematic liquid crystal molecules using nanometer-sized ultrafine patterns by electron beam exposure method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 1 B, 2005, Pages 578-581

  Kagajyo, Taichi ^a   Fujibayashi, Katsutoshi ^a   Shimamura, Toru ^a   Okada, Hiroyuki ^a   Onnagawa, Hiroyoshi ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Alignment; Anchoring energy; Electron beam exposure; Liquid crystal

Indexed keywords

ELECTRON BEAMS; SCANNING ELECTRON MICROSCOPY; SILICA; SPUTTERING; TORQUE; WETTING;

ANCHORING ENERGY; ELECTRON BEAM EXPOSURE; GROOVE PATTERNS; ULTRAFINE GROOVE;

NEMATIC LIQUID CRYSTALS;

EID: 17044376298     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.578     Document Type: Conference Paper

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