Vertically Aligned Nematic Liquid Crystal Display Usine Dual-Interference Exposure Method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 1, 2004, Pages 256-260

  Shimamura, Toru ^a   Okada, Hiroyuki ^a   Onnagawa, Hiroyoshi ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Interference exposure; Liquid crystal; Vertical alignment

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; HYSTERESIS; IMAGE ANALYSIS; INTERFEROMETERS; LASERS; NITROGEN; PHOTOMULTIPLIERS; PHOTOSENSITIVITY; SILICA; SPUTTERING;

INTERFERENCE EXPOSURE; VERTICAL ALIGNMENT;

NEMATIC LIQUID CRYSTALS;

EID: 1842810858     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.256     Document Type: Article

References (1)

1. A. Takeda, S. Kataoka, T. Sasaki, H. Chida, H. Tsuda, K. Ohmuro, Y. Koike, T. Sasabayashi and K. Okamoto: SID'98 (1998) p. 41.1.